DOI RECORD
Cu/Bi layer stacking engineering the characteristics of Cu3BiS3 thin films
DOI10.1016/j.physb.2026.419495
PublisherElsevier BV
Journal / SourcePhysica B: Condensed Matter
Published2026-10
Metadata Deposited2026-10-08 (updated: 2026-10-08)
Subject—
Languageen
ISSN0921-4526
Typejournal-article
Volume / Issue / Pages— / — / 419495
Citations0
References deposited45
Access / license metadataRestricted reuse / TDM license License 1 ↗ License 2 ↗ License 3 ↗ License 4 ↗ License 5 ↗ License 6 ↗ License 7 ↗A reuse license does not by itself establish whether the full text is freely readable.
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